Scanning probe lithography on calixarene towards single-digit nanometer fabrication
نویسندگان
چکیده
منابع مشابه
Nanometer-accurate Grating Fabrication with Scanning Beam Interference Lithography
We are developing a Scanning Beam Interference Lithography (SBIL) system. SBIL represents a new paradigm in semiconductor metrology, capable of patterning large-area linear gratings and grids with nanometer overall phase accuracy. Realizing our accuracy goal is a major challenge because the interference fringes have to be locked to a moving substrate with nanometer spatial phase errors while th...
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High-resolution lithography often involves thin resist layers which pose a challenge for pattern characterization. Direct evidence that the pattern was well-defined and can be used for device fabrication is provided if a successful pattern transfer is demonstrated. In the case of thermal scanning probe lithography (t-SPL), highest resolutions are achieved for shallow patterns. In this work, we ...
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ژورنال
عنوان ژورنال: International Journal of Extreme Manufacturing
سال: 2020
ISSN: 2631-7990
DOI: 10.1088/2631-7990/aba2d8